Improved merged-element transmon using micrometer-scale Al/AlOₓ/Al overlap junctions with optimized long oxidation. Demonstrates T₁ = 10–90 μs with annealed devices exceeding 100 μs. Shows that junction loss is not the primary coherence limiter in small-junction transmons, suggesting a path to high-coherence compact qubits.

Key Results

  • T₁: 10–90 μs (up to >100 μs with annealing)
  • Micrometer-scale overlap junctions with long oxidation
  • Low subgap conduction indicates high-quality tunnel barrier
  • Junction loss is NOT the dominant limiter
  • Path to high-coherence compact qubits via improved barrier materials